JPS6313529B2 - - Google Patents

Info

Publication number
JPS6313529B2
JPS6313529B2 JP54076217A JP7621779A JPS6313529B2 JP S6313529 B2 JPS6313529 B2 JP S6313529B2 JP 54076217 A JP54076217 A JP 54076217A JP 7621779 A JP7621779 A JP 7621779A JP S6313529 B2 JPS6313529 B2 JP S6313529B2
Authority
JP
Japan
Prior art keywords
photosensitive
resin
plate
weight
ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54076217A
Other languages
English (en)
Japanese (ja)
Other versions
JPS561045A (en
Inventor
Masatake Uehara
Akio Iwaki
Yoko Ogawa
Takeo Shimada
Masatoshi Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP7621779A priority Critical patent/JPS561045A/ja
Priority to US06/154,120 priority patent/US4306011A/en
Priority to DE8080301955T priority patent/DE3066569D1/de
Priority to EP80301955A priority patent/EP0021716B1/en
Publication of JPS561045A publication Critical patent/JPS561045A/ja
Publication of JPS6313529B2 publication Critical patent/JPS6313529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP7621779A 1979-06-16 1979-06-16 Photosensitive composition Granted JPS561045A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7621779A JPS561045A (en) 1979-06-16 1979-06-16 Photosensitive composition
US06/154,120 US4306011A (en) 1979-06-16 1980-05-28 Photosensitive composite and photosensitive lithographic printing plate
DE8080301955T DE3066569D1 (en) 1979-06-16 1980-06-10 Condensation product and lithographic printing plates containing said product
EP80301955A EP0021716B1 (en) 1979-06-16 1980-06-10 Condensation product and lithographic printing plates containing said product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7621779A JPS561045A (en) 1979-06-16 1979-06-16 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS561045A JPS561045A (en) 1981-01-08
JPS6313529B2 true JPS6313529B2 (en]) 1988-03-25

Family

ID=13599000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7621779A Granted JPS561045A (en) 1979-06-16 1979-06-16 Photosensitive composition

Country Status (4)

Country Link
US (1) US4306011A (en])
EP (1) EP0021716B1 (en])
JP (1) JPS561045A (en])
DE (1) DE3066569D1 (en])

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3174017D1 (en) * 1980-12-17 1986-04-10 Konishiroku Photo Ind Photosensitive compositions
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
JPS58134631A (ja) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd 感光性組成物
JPS5986046A (ja) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS5988734A (ja) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd 感光性組成物
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
US4634659A (en) * 1984-12-19 1987-01-06 Lehigh University Processing-free planographic printing plate
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0650396B2 (ja) * 1985-08-09 1994-06-29 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPS6273255A (ja) * 1985-09-26 1987-04-03 Konishiroku Photo Ind Co Ltd 感光性組成物
JPH0719050B2 (ja) * 1985-12-09 1995-03-06 コニカ株式会社 感光性平版印刷版材料
EP0227487B1 (en) * 1985-12-27 1992-07-15 Japan Synthetic Rubber Co., Ltd. Positive type radiation-sensitive resin composition
JPS62163055A (ja) * 1986-01-14 1987-07-18 Mitsubishi Chem Ind Ltd ポジ型感光性平版印刷版
DE3821584A1 (de) * 1988-06-25 1989-12-28 Hoechst Ag Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichungsmaterial fuer hochenergetische strahlung
SG48028A1 (en) * 1988-08-10 1998-04-17 Hoechst Celanese Corp Light-sensitive novolac resins
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
DE69129955T2 (de) * 1990-05-02 1998-12-24 Mitsubishi Chemical Corp., Tokio/Tokyo Photolackzusammensetzung
JPH06204162A (ja) * 1992-12-28 1994-07-22 Mitsubishi Electric Corp 半導体装置の製造方法および該方法に用いられるレジスト組成物
US5589553A (en) * 1995-03-29 1996-12-31 Shipley Company, L.L.C. Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
DE69604114T2 (de) * 1995-04-10 2000-03-02 Shipley Co., L.L.C. Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist
PL324248A1 (en) 1996-04-23 1998-05-11 Horsell Graphic Ind Ltd Composition sensitive to heat and method of making lithographic formes incorporating such compositions
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5858626A (en) * 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
JP2002511955A (ja) 1997-07-05 2002-04-16 コダック・ポリクローム・グラフィックス・エルエルシー パターン形成方法
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
EP0982123B1 (en) * 1998-08-24 2004-07-21 Fuji Photo Film Co., Ltd. Image recording material and planographic printing plate using the same
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (en]) * 1950-10-31
GB1113759A (en) * 1965-12-17 1968-05-15 Fuji Photo Film Co Ltd Lithographic printing plates
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
NL6702623A (en]) * 1967-02-21 1968-08-22
GB1227602A (en]) * 1967-11-24 1971-04-07
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS505084B1 (en]) * 1970-09-16 1975-02-28
JPS505083B1 (en]) * 1970-09-16 1975-02-28
JPS4924361B1 (en]) * 1970-11-21 1974-06-22
JPS5723253B2 (en]) * 1974-03-25 1982-05-18
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
CA1085212A (en) * 1975-05-27 1980-09-09 Ronald H. Engebrecht Use of volatile carboxylic acids in improved photoresists containing quinone diazides

Also Published As

Publication number Publication date
JPS561045A (en) 1981-01-08
EP0021716A1 (en) 1981-01-07
EP0021716B1 (en) 1984-02-15
US4306011A (en) 1981-12-15
DE3066569D1 (en) 1984-03-22

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